Photoresist Direct Write Lithography System

Agency: DEPT OF DEFENSE
State: Federal
Type of Government: Federal
FSC Category:
  • 36 - Special Industry Machinery
NAICS Category:
  • 333242 - Semiconductor Machinery Manufacturing
Set Aside: Total Small Business Set-Aside (FAR 19.5)
Posted Date: Aug 29, 2025
Due Date:
Solicitation No: N0017325Q0006
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Description

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Photoresist Direct Write Lithography System
Active
Contract Opportunity
Notice ID
N0017325Q0006
Related Notice
N0017325Q0006
Contract Line Item Number
Department/Ind. Agency
DEPT OF DEFENSE
Sub-tier
DEPT OF THE NAVY
Major Command
ONR
Sub Command
ONR NRL
Office
NAVAL RESEARCH LABORATORY
Award Details
  • Contract Award Date: Aug 29, 2025
  • Contract Award Number: N0017325P0057
  • Task/Delivery Order Number:
  • Contractor Awarded Unique Entity ID: PLE9J4EGK5V6
  • Contractor Awarded Name: RAITH AMERICA INC
  • Contractor Awarded Address: Troy , NY 12180 USA
  • Base and All Options Value (Total Contract Value): $485,800.00
General Information
  • Contract Opportunity Type: Award Notice (Original)
  • Original Published Date: Aug 29, 2025 01:59 pm EDT
  • Inactive Policy: 15 days after contract award date
  • Original Inactive Date: Sep 13, 2025
  • Initiative:
    • None
Classification
  • Original Set Aside: Total Small Business Set-Aside (FAR 19.5)
  • Product Service Code: 3670 - SPECIALIZED SEMICONDUCTOR, MICROCIRCUIT, AND PRINTED CIRCUIT BOARD MANUFACTURING MACHINERY
  • NAICS Code:
    • 333242 - Semiconductor Machinery Manufacturing
  • Place of Performance:
    USA
Description

This contract is awarded to Raith America Inc. as a total small business set-aside (FAR 19.5), under purchases of Commercial Items IAW FAR part 12 and 13.5 for the procurement of Photoresist Direct Write Lithography System (PWDL).


Attachments/Links
Contact Information
Contracting Office Address
  • 4555 OVERLOOK AVE SW
  • WASHINGTON , DC 20375-5328
  • USA
Primary Point of Contact
Secondary Point of Contact
History

Related Document

Jun 3, 2025[Combined Synopsis/Solicitation (Original)] Photoresist Direct Write Lithography System
Jun 25, 2025[Combined Synopsis/Solicitation (Updated)] Photoresist Direct Write Lithography System
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See Also

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36--AIR SEPARATION MODU

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Due by 10/19/2026

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