Chlorine ICP Etcher

Agency: Department of Commerce
State: Maryland
Type of Government: Federal
FSC Category:
  • 66 - Instruments and Laboratory Equipment
NAICS Category:
  • 333242 - Semiconductor Machinery Manufacturing
Posted Date: Sep 21, 2017
Due Date:
Solicitation No: SB1341-17-RQ-0461
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Solicitation Number :
SB1341-17-RQ-0461
Notice Type :
Award
Contract Award Date :
September 20, 2017
Contract Award Number :
SB134117SU0768
Contract Award Dollar Amount :
$599,247.00
Contract Line Item Number :
All
Contractor Awarded Name :
Oxford Instruments America, Inc.
Contractor Awarded DUNS :
114229701
Contractor Awarded Address :
130A Baker Ave Ext
Concord, Massachusetts 01742
United States
Synopsis :
Added: Jul 07, 2017 1:39 pm Modified: Jul 17, 2017 2:03 pm Track Changes
AMENDMENT 1:

The purpose of this amendment is to correct the posting title and extend the due date for quotations as follows:

Title is updated as follows:

From: Chlorine ICQ Etcher

To: Chlorine ICP Etcher

Due date for quotations is extended as follows:

From: July 20, 2017 noon EST

To: July 27, 2017 noon EST

ALL OTHER SOLICITATION TERMS AND CONDITIONS REMAIN UNCHANGED


***** PLEASE NOTE: Full details for this requirement can be found in the attached solicitation document. Please review the attached solicitation for requirement details, instructions/evaluation information, and terms and conditions.*****


THIS IS A COMBINED SYNOPSIS/SOLICITATION FOR COMMERCIAL ITEMS PREPARED IN ACCORDANCE WITH THE FORMAT IN FAR SUBPART 12.6-STREAMLINED PROCEDURES FOR EVALUATION AND SOLICITATION FOR COMMERCIAL ITEMS-AS SUPPLEMENTED WITH ADDITIONAL INFORMATION INCLUDED IN THIS NOTICE. THIS ANNOUNCEMENT CONSTITUTES THE ONLY SOLICITATION; QUOTATIONS ARE BEING REQUESTED, AND A SEPARATE WRITTEN SOLICITATION DOCUMENT WILL NOT BE ISSUED. THE SOLICITATION IS BEING ISSUED USING SIMPLIFIED ACQUISITION PROCEDURES FOR CERTAIN COMMERCIAL ITEMS UNDER THE AUTHORIRTY OF FAR 13.5.
This solicitation is a Request for Quotation (RFQ). The solicitation document and incorporated provisions and clauses are those in effect through Federal Acquisition Circular (FAC) 2005-95.
1352.215-72 INQUIRIES (APR 2010)
Offerors must submit all questions concerning this solicitation in writing, via email, to both the Contract Specialist (joni.laster@nist.gov) and the Contracting Officer (forest.crumpler@nist.gov). Questions shall be received no later than seven (7) calendar days after the issuance date of this solicitation.
All responses to the questions will be made in writing, without identification of the questioner, and will be included in an amendment to the solicitation. Even if provided in other form, on the question responses included in the amendment to the solicitation will govern performance of the contract. (end of provision)
The associated North American Industrial Classification System (NAICS) code for this procurement is 333242 with a small business size standard of 1500 employees or less.
This acquisition is being competed under full and open competition.


BACKGROUND
The National Institute of Standards and Technology (NIST) has a requirement for an Inductively Coupled Plasma (ICP) Etch System to support nanofabrication in the Center for Nanoscale Science and Technology (CNST) user facility.


The system will be sited and used as a shared resource accessible to researchers from industry, academia, NIST, and other government agencies in the CNST NanoFab. The ICP System is a pattern transfer tool that uses chlorine and other chemicals to fabricate three-dimensional structures in varied substrate materials. Applications include fabricating nano-semiconductor and nano-photonic devices.


The NanoFab currently operates several ICP Systems that are heavily used to fabricate a wide variety of devices with different chemical etching gases and substrate materials. However, the current tools
cannot meet the requirements of a growing number of NanoFab users. More and more materials, such as metals, silicon, III-V compounds and diamond, are being etched in one shared ICP system. The mixing of the different etching processes in one system causes chemical cross-contamination process variation. To minimize the cross-contamination, improve the process control and increase the NanoFab's capacity to serve users, the NanoFab has a need for a new ICP System with Chlorine and other gas etching capability.


GENERAL DESCRIPTION
As described above, this ICP system is a pattern transfer tool that uses an inductively coupled plasma to fabricate three-dimensional structures in III-V compound semiconductors and other materials with desired profiles, primarily using Chlorine and similar etching gases. This new ICP will be used to minimize the chemical cross-contamination, improve the process repeatability and add new NanoFab's etching process capabilities.


All items must be new. Prototypes, first articles, demonstration models, used, refurbished or otherwise developmental systems, will not be considered for award.
All offerors shall provide a firm fixed price quotation for the following line items:
LINE ITEM 0001: Quantity One (1) Inductively Coupled Plasma (ICP) Etch System to include the following components and shall meet or exceed all the specifications identified for each component.

Added: Aug 10, 2017 11:01 am
Amendment II:

The purpose of this amendment is to correct a typo graphical error in the minimum requirements and extend the due date for quotations as follows:

Minimum Specification F.1. under the Pumping System is hereby amended as follows:

FROM:
1. Process modules shall be able to reach and maintain a base pressure of 5x10-7 Torr in less than 24 hours from atmosphere after chamber has been open.

TO:
1. Process modules shall be able to reach and maintain a base pressure of 5x10-6 Torr in less than 24 hours from atmosphere after chamber has been open.

The due date for quotations has been extended as follows:

FROM:
July 27, 2017 @ 12pm EST

TO:
August 17, 2017@ 12pm EST

Please see the attachment "Revised Solicitation for Amendment II", highlighted areas, for the applicable changes.

All other terms and conditions remain unchanged and no more extensions to the due date/time shall be issued.
Please consult the list of document viewers if you cannot open a file.
Combined Synopsis/Solicitation
Type:
Other (Draft RFPs/RFIs, Responses to Questions, etc..)
Label:
Combined Synopsis/Solicitation
Posted Date:
July 7, 2017
Description: Solicitation document
Amendment 1
Type:
Mod/Amendment
Posted Date:
August 10, 2017
Description: Revised Solicitation for Amendment II
Contracting Office Address :
100 Bureau Drive, Building 301
Room B130
Gaithersburg, Maryland 20899-1410
United States
Place of Performance :
100 Bureau Drive
Gaithersburg, Maryland 20899
United States
Primary Point of Contact. :
Forest Crumpler,
Contracting Officer
Phone: 3019756753
Secondary Point of Contact :
Joni L. Laster,
Contract Specialist
Phone: 3019756205

Related Document

Jul 17, 2017[Combined Synopsis/Solicitation] Chlorine ICP Etcher
Aug 11, 2017[Combined Synopsis/Solicitation] Chlorine ICP Etcher

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