|Agency:||Department of Commerce|
|Type of Government:||Federal|
|Posted Date:||Sep 21, 2017|
|Bid Source:||Please Login to View Page|
|Contact information:||Please Login to View Page|
|Bid Documents:||Please Login to View Page|
Solicitation Number :
Notice Type :
Contract Award Date :
September 20, 2017
Contract Award Number :
Contract Award Dollar Amount :
Contract Line Item Number :
Contractor Awarded Name :
Oxford Instruments America, Inc.
Contractor Awarded DUNS :
Contractor Awarded Address :
130A Baker Ave Ext
Concord, Massachusetts 01742
Added: Jul 07, 2017 1:39 pm Modified: Jul 17, 2017 2:03 pm Track ChangesAMENDMENT 1:
The purpose of this amendment is to correct the posting title and extend the due date for quotations as follows:
Title is updated as follows:
From: Chlorine ICQ Etcher
To: Chlorine ICP Etcher
Due date for quotations is extended as follows:
From: July 20, 2017 noon EST
To: July 27, 2017 noon EST
ALL OTHER SOLICITATION TERMS AND CONDITIONS REMAIN UNCHANGED
***** PLEASE NOTE: Full details for this requirement can be found in the attached solicitation document. Please review the attached solicitation for requirement details, instructions/evaluation information, and terms and conditions.*****
The system will be sited and used as a shared resource accessible to researchers from industry, academia, NIST, and other government agencies in the CNST NanoFab. The ICP System is a pattern transfer tool that uses chlorine and other chemicals to fabricate three-dimensional structures in varied substrate materials. Applications include fabricating nano-semiconductor and nano-photonic devices.
The NanoFab currently operates several ICP Systems that are heavily used to fabricate a wide variety of devices with different chemical etching gases and substrate materials. However, the current tools
All items must be new. Prototypes, first articles, demonstration models, used, refurbished or otherwise developmental systems, will not be considered for award.
Added: Aug 10, 2017 11:01 amAmendment II:
The purpose of this amendment is to correct a typo graphical error in the minimum requirements and extend the due date for quotations as follows:
Minimum Specification F.1. under the Pumping System is hereby amended as follows:
1. Process modules shall be able to reach and maintain a base pressure of 5x10-7 Torr in less than 24 hours from atmosphere after chamber has been open.
1. Process modules shall be able to reach and maintain a base pressure of 5x10-6 Torr in less than 24 hours from atmosphere after chamber has been open.
The due date for quotations has been extended as follows:
July 27, 2017 @ 12pm EST
August 17, 2017@ 12pm EST
Please see the attachment "Revised Solicitation for Amendment II", highlighted areas, for the applicable changes.
All other terms and conditions remain unchanged and no more extensions to the due date/time shall be issued.
Please consult the list of document viewers if you cannot open a file.
Other (Draft RFPs/RFIs, Responses to Questions, etc..)
July 7, 2017
August 10, 2017
Contracting Office Address :
100 Bureau Drive, Building 301
Gaithersburg, Maryland 20899-1410
Place of Performance :
100 Bureau Drive
Gaithersburg, Maryland 20899
Primary Point of Contact. :
Secondary Point of Contact :
Joni L. Laster,
|Jul 17, 2017||[Combined Synopsis/Solicitation] Chlorine ICP Etcher|
|Aug 11, 2017||[Combined Synopsis/Solicitation] Chlorine ICP Etcher|
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