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66--Scanning Electron Microscope (SEM)
Program Summary
Title: 66--Scanning Electron Microscope (SEM)
GovCB Opps ID : ADP12108156440000035
Document Type: Sources Sought
FSC Code: 66 - Instruments and Laboratory Equipment
Set Aside: N/A
Solicitation No.: W81EWF80875656
Source: https://www.fbo.gov/?s=opportunity&mode=form&id=553d4309b95f1093819e357b0dffd13a&tab=cor...
Place of
Performance:

Posted Date:
May 13, 2008
Last Update: May 14, 2008
Due Date: May 16, 2008

Description
66--Scanning Electron Microscope (SEM)
Solicitation Number: W81EWF80875656
Agency: Department of the Army
Office: U.S. Army Corps of Engineers
Location: U.S. Army Engineer District, Vicksburg
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Opportunity History
  • Original Synopsis
    May 13, 2008
Solicitation Number:
W81EWF80875656
Notice Type:
Sources Sought
Synopsis:
Added: May 13, 2008 4:23 pm
The Government is interested in obtaining information regarding a Scanning Electron Microscope System used to study the chemical and physical properties of concrete and other materials on the microscopic level. Analysis of the needs for the system requires imaging of nanosized, uncoated conductive samples of various materials including building materials, soils, etc. The ERDC requires that uncoated samples such as concrete be imaged. Furthermore, research into nano-sized materials requires precise navigation to allow repeatability and consistency in measurement. In addition, the ERDC requires imaging of samples at both high and low accelerating voltages to be able to not damage samples as well as be able to obtain quantitative chemical analysis.

The Government is interested in any vendor that can furnish and deliver the system with the following specifications:

1. Schottky Field Emission Scanning Electron Microscope (FESEM) that combines high- and low-voltage ultra-high resolution capabilities. A low-voltage BSE detector must be included to obtain superior contrast and compositional information. It must have an immersion lens mode combined with low-vacuum that will allow for unique, ultra-high resolution, characterization in an environment that suppresses charge build-up on non-conductors without limiting the overall size of the specimen. Clean and contrasted imaging is required when imaging in low vacuum for those samples that suffer from residual surface contamination.

2. The system must be equipped with a complete oil-free vacuum system. In addition, the gun section must be pumped by a two-stage ion getter pump and separated from the specimen chamber by an isolation valve. Through-the-lens differential pumping must be included to enable the use of two specimen chamber vacuum modes: high vacuum and low vacuum. Specimen exchange must be able to be made in a few minutes. The system must be able to be switched between two vacuum modes enabling the investigation of conductive, non-conductive and high-vacuum incompatible materials: High vacuum (typically 10-5 mbar) for imaging and microanalysis of conductive and/or conventionally prepared specimens; Low vacuum (up to 200 Pa chamber pressure) for imaging and microanalysis of non-conductive specimens without preparation or coating;

3. The FESEM must be equipped with a 5-axes motorized x-y-z-rotate-tilt stage, of which x, y, and rotation movements are piezo-controlled. Movements provided must be: x = y = 150 mm (motorized); z = 10 mm (motorized); Tilt +60 to 5 degrees (motorized); Minimum step size is 100 nm; Repeatability at 0 degrees tilt is 1 m, and 2 m at greater than 50 degrees tilt. Stage control software must include standard facilities for: Store and recall of sample position; Double-click feature select function; Multi-directional stage drive; Rotation

4. The Electron optics system features must include: The Schottky FEG gun, a high stability ultra-high brightness FE electron source with high beam current capability; A two-mode final lens, allowing for immersion and field-free operation. The field-free mode ensures undistorted, very low magnification imaging. In immersion mode, the highest resolution is achieved; Beam deceleration, which can be activated for getting higher surface sensitivity and contrast using low and very low landing energies down to 50 eV, must be implemented as an additional degree of freedom to optimize contrast and surface sensitivity while improving the optical performance of the electron column.

Source: FEG with ultra-high brightness Schottky field emitter
Voltage: High voltage 200 V to 30 kV, continuously adjustable
Landing energy: 50 V to 30 kV, continuously adjustable
Beam Current: Up to 100 nA
Resolution: High-vacuum: 1.0 nm @ 15 kV, 1.6 nm @ 1 kV with secondary electrons (SE); Low-vacuum: 1.8 nm @ 3 kV, with optional SE detector

5. The system must have high-resolution digital scanning engine controlled from the user interface:

Resolution: 512x442, 1024x884, 2048x1768, 3584x3094 pixels
Minimum dwell time: 50 ns/pixel
Electronic scan rotation by n x 360 degrees

6. The system must have an in-lens SE and BSE detection for high-resolution imaging at both high and low kVs, as well as an Everhart-Thornley SE detector for conventional SE detection. The balanced field extraction system of this in- the-lens detector must allow continuous mixing of SE and BSE electrons. This in-lens system allows TV rate BSE imaging to an accelerating voltage of 1 kV. For imaging of non-conductive or contaminating samples, the system must be equipped with an SE detector that directly detects SE from gas amplification, as opposed to indirect means of photomultiplier detectors, and enables imaging in low vacuum at low high-tension values, giving maximum surface information and minimal contamination. An integrated IR-CCD camera for in-chamber viewing must be included.

7. Images must be displayed in an area of 1024 x 884 pixels, configurable for single frame display or 4-quadrant (live) display. Images must be able to be viewed live, averaged or integrated. Images must be able to be saved in TIFF, BMP or JPEG file formats, and in 8-bit or 16-bit depth, to the hard disk on a support computer provided with the system or LAN (via the Support Computer) from the graphical user interface. Image printing must be available from the user interface.

This Sources Sought is for information and planning purposes only, and does not constitute a Request for Quote (RFQ). This Sources Sought is not to be construed as a commitment by the U. S. Government. If a formal solicitation is generated at a later date, a solicitation notice will be published. No award will be made as a result of this Sources Sought. All information is to be submitted at no cost or obligation to the Government. The Government reserves the right to reject, in whole or in part, any private sector input as a result of this Sources Sought. Respondents will not be notified of the results of this survey or results of information submitted. The Government respectfully requests information on or before 3:00 PM CST, Friday, 16 May 07. Please provide brochures, pamphlets or other marketing information to Brandy Ellison, Contract Specialist, ERDC Contracting Office, 3909 Halls Ferry Road, Bldg. 1003, Vicksburg, MS 39180-6199, or email at Brandy.M.Ellison@usace.army.mil.

Contracting Office Address:
Vicksburg Consolidated Contracts Office, Vicksburg, ATTN: ERDC, 4155 Clay Street, Vicksburg, MS 39183-3435
Place of Performance:
ERDC Contracting Office ATTN: ERDC, 3909 Halls Ferry Road Vicksburg MS 39180-6199 US
Point of Contact(s):
General Information
Notice Type:
Sources Sought
Posted Date:
May 13, 2008
Response Date:
May 16, 2008
Archiving Policy:
Automatic, on specified date
Archive Date:
July 15, 2008
Original Set Aside:
N/A
Set Aside:
N/A
Classification Code:
66 -- Instruments & laboratory equipment
NAICS Code:
334 -- Computer and Electronic Product Manufacturing/334519 -- Other Measuring and Controlling Device Manufacturing




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